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技術案内

天谷製作所は、常圧CVDに関する様々な技術開発を行っています。

• APCVD Application

以下のテーマで論文を発表しています。論文の詳細は弊社までお問い合わせ下さい。

• 「Investigation of Boron Thermal Diffusion from Atmospheric Pressure Chermical Vapor Deposited Boron Silicate Glass for N-Type Solar Cell Process Appplication」
  詳細は、http://www.hindawi.com/journals/ijp/2016/8183673/をご確認下さい。
• 「Analytical boron diffusivity model in silicon for thermal diffusion from boron silicate glass filn」
  Japanese Jurnal of Applied Physics 54 096502(2015)
• "INVESTIGATION OF BORON SOLID-PHASE DIFFUSION FROM BSG FILM DEPOSITED BY AP-CVD FOR SOLAR
  CELL APPLICATION,"27th European Photovoltaic Solar Energy Conference,pp.1837-1876,2012
• "AN ACCURATE ANALYTICAL MODEL OF BORON DIFFUSION FROM AP-CVD BSG FOR SOLAR CELL PROCESS OPTIMIZATION,"28th European Photovoltaic Solar Energy Conference,pp.1085-1089,2013

• "BORON DIFFUSION PROFILE ESTIMATION USING MEASURED SHEET RESISTANCE FOR T-CAD SOLAR CELL SIMULATION,"29th European Photovoltaic Solar Conference,pp.855-858,2014

• "Emitter layer design by thermal diffusion process for N-type crystalline silicon solar cells,"29th European Photovoltaic Solar Energy Conference,pp.900-903,2014

• "Enhancement and retardation of thermally boron diffusion in silicon from atmospheric pressure chemical vapor deposited boron silicate glass film,"Jap.J.Appl.Phys.53 p.036504,2014

• "Analytical boron diffusivity model in silicon for thermal diffusion from boron silicate glass film,"Jap.J.Appl.Phys.54 p.096502,2015

• SiH₄/O₃による低温常圧CVDS：O₂膜の域と酸化物半導体TFTへの適用　第79回応用物理学会秋季講演会（2018年9月20日）