Skip
HOMEPRODUCTSTECHNOLOGYCOMPANY PROFILEQUALITY POLICYSUPPORTCONTACT US
HOME  >  TECHNOLOGY

TECHNOLOGY

Amaya has been developing various technologies for APCVD.

  • APCVD Application
  • 「Investigation of Boron Thermal Diffusion from Atmospheric Pressure Chermical Vapor Deposited Boron Silicate Glass for N-Type Solar Cell Process Appplication」
    The details:http://www.hindawi.com/journals/ijp/2016/8183673/ please confirm.
  • 「Analytical boron diffusivity model in silicon for thermal diffusion from boron silicate glass film」
    Japanese Jurnal of Applied Physics 54 096502(2015)
  • "INVESTIGATION OF BORON SOLID-PHASE DIFFUSION FROM BSG FILM DEPOSITED BY AP-CVD FOR SOLAR
    CELL APPLICATION,"27th European Photovoltaic Solar Energy Conference,pp.1837-1876,2012
  • "AN ACCURATE ANALYTICAL MODEL OF BORON DIFFUSION FROM AP-CVD BSG FOR SOLAR CELL PROCESS OPTIMIZATION,"28th European Photovoltaic Solar Energy Conference,pp.1085-1089,2013
  • "BORON DIFFUSION PROFILE ESTIMATION USING MEASURED SHEET RESISTANCE FOR T-CAD SOLAR CELL SIMULATION,"29th European Photovoltaic Solar Conference,pp.855-858,2014

  • "Emitter layer design by thermal diffusion process for N-type crystalline silicon solar cells,"29th European Photovoltaic Solar Energy Conference,pp.900-903,2014
  • "Enhancement and retardation of thermally boron diffusion in silicon from atmospheric pressure chemical vapor deposited boron silicate glass film,"Jap.J.Appl.Phys.53 p.036504,2014

  • "Analytical boron diffusivity model in silicon for thermal diffusion from boron silicate glass film,"Jap.J.Appl.Phys.54 p.096502,2015

  • Low Temperature SiO2 Atmospheric Pressure Chemical Vapor Deposition using SiH4/O3 and its application to oxide-semiconductor for TFTs
    The 79th JSAP Autumn Meeting 2018 (Sept 20th, 2018)

If you have any questions, Please contact us.