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HOME  >  PRODUCTS  >  Continuous APCVD A6300S

PRODUCTS

Continuous High Throughput APCVD for 6 inch or below.

A6300S

  • 120WPH at 6 inch and/or smaller dia. Wafers.
  • Metal addition Free design and Long Term Stable Process with SiC Tray.

Feature

  • High volume production continuous APCVD to meet with user's need to process 120WPM for 6 inch and smaller wafers.
  • Developped wider area deposition dispersion head dedicated to A6300S and minimize the number of trays to reduce the cost of system.
  • SiC Trays as susceptors prevent heavy metal addition and help long term stable process for long term production.
  • Good maintenability and Operators safety are given by automated head base liftting system and automated tray exchange system, that shorten PM time for longer use of system

Performance

Film Thickness Nu ≦±4.0%
Wafer Size 6 inch or the less
Gas SiH4, O2, PH3, B2H6, N2
Deposition Temp. 350℃~450℃
Productivity 120 WPH

Specifictions

System Size 1500mm(W) x 2850mm(D) x 2000mm(H)
Heaters Heater Coils
Loader/Unloader Robot Cassette to Cassette Transfer
Dispersion Head (Gas Nozzle) A63 Type Dispersion Head

Service Division

TEL:+81-48-989-1881

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